Speech theme:

Intelligent Manufacturing for the Future - Technological Breakthroughs and Application Practices of Anhui Yuehao Advanced Equipment

Speech summary:

Against the backdrop of accelerating advancements in next-generation semiconductor display technologies, large-size panel manufacturing processes are imposing increasingly stringent requirements on PVD (Physical Vapor Deposition) equipment. Notably, significant technical bottlenecks persist in areas such as film thickness uniformity, particle contamination control, and the stability of drive systems.

This presentation will conduct an in-depth analysis of the critical challenges currently faced by PVD equipment used in displays, particularly regarding uniformity and particle pollution control. We will also share how Yuehao Electronics has achieved performance breakthroughs—enhancing film uniformity and system cleanliness—through the application of magnetic field and flow field simulation technologies, as well as magnetically levitated drive systems.

The talk will further introduce the technical achievements of Yuehao’s independently developed G8.6 generation continuous PVD equipment. This equipment has already been successfully integrated into panel manufacturers' production lines, with core modules achieving an impressive localization rate exceeding 85%. This milestone significantly reduces equipment costs and mitigates supply chain risks.